Category Archives: atomic layer deposition
New Zenodo community! ALD saturation profile open data. Ideas? Questions?
Yesterday, I created a new Zenodo community: “ALD saturation profile open data”, https://zenodo.org/communities/ald-saturation-profile-open-data/. In my research group, we intend to use this first for sharing experimental saturation profile data related to a publication we are writing (access through the ChemRxiv, https://doi.org/10.26434/chemrxiv.12366623). … Continue reading
Virtual guest speaker with Bent group Stanford – other groups interested in an ALD fundamentals talk?
Yesterday, I participated a Prof. Bent group meeting (Stanford), giving again the presentation we gave jointly with Prof. Ruud van Ommen at the recent ALD conference (see previous post), entitled “On the fundamentals of ALD: the importance of getting the … Continue reading
“On the fundamentals of ALD: the importance of getting the picture right” – by Puurunen and van Ommen
Jointly with Prof. Ruud van Ommen, I (Prof. Riikka Puurunen) gave a presentation at the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020), adapted into a Virtual Meeting, … Continue reading
Panopto records: November Networking – ALD at Aalto University
At the “November Networking – ALD at Aalto University” event on November 29, 2019, we experimented with recording (some of the) talks with the Panopto lecture capture system available at Aalto University. The records have now been finalized. Each author … Continue reading
Happy 45th anniversary, ALD in Finland – Aalto ALD OpenLearning opens
Exactly forty-five years ago, on November 29, 1974, the first patent on Atomic Layer Epitaxy (FIN 52359) was filed by Suntola and Antson. Today, the Aalto ALD OpenLearning site is opened for public. You can access it via the general link https://openlearning.aalto.fi/ and the direct link https://openlearning.aalto.fi/course/view.php?id=100. Above … Continue reading
Advance info on OpenLearning site on Atomic Layer Deposition + request to recommend ALD reviews
Advance info: On Nov 29, 2019, a new OpenLearning site is planned to open on atomic layer deposition (ALD) at the http://openlearning.aalto.fi platform. The site is meant to benefit the global ALD community and operate mostly in English; occasionally, the … Continue reading
