Tag Archives: ALD fundamentals
June 27-30, 2021, there was the 21st International Conference on Atomic Layer Deposition (ALD 2021), https://ald2021.avs.org/, organized as a virtual meeting. I had the honour of giving an invited tutorial: Fundamentals of atomic layer deposition: an introduction (“ALD101”). The pre-recorded tutorial … Continue reading
Virtual guest speaker with Bent group Stanford – other groups interested in an ALD fundamentals talk?
Yesterday, I participated a Prof. Bent group meeting (Stanford), giving again the presentation we gave jointly with Prof. Ruud van Ommen at the recent ALD conference (see previous post), entitled “On the fundamentals of ALD: the importance of getting the … Continue reading