Category Archives: atomic layer deposition

Invited tutorial on atomic layer deposition (ALD) at ALD 2021 conference

June 27-30, 2021, there was the 21st International Conference on Atomic Layer Deposition (ALD 2021), https://ald2021.avs.org/, organized as a virtual meeting.  I had the honour of giving an invited tutorial:  Fundamentals of atomic layer deposition: an introduction (“ALD101”). The pre-recorded tutorial … Continue reading

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Promo video of the COOLCAT project and Catalysis group

We made a video to tell (i) specifically about the COOLCAT project funded by the Academy of Finland through the C1 value programme, and (ii) additionally also of the Catalysis group led by Prof. Puurunen in general. You can view … Continue reading

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Registration open for 2020 November Networking – ALD at Aalto University

Continuing the tradition (?) started in 2019, a networking event will be organized around atomic layer deposition (ALD): 2020 November Networking – ALD at Aalto University. The event will take place on November 25 and 26, 2020. Due to COVID-19, in … Continue reading

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History of ALD – ALD stories podcast Episode 2 with Riikka Puurunen

On October 16, 2020, ALD stories podcast Episode 2 was published, where I (Riikka Puurunen) had an honor of being interviewed by Lie Luo and Patrick Gonzalez of Beneq. Episode 2 is about the history of atomic layer deposition (ALD), but … Continue reading

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New Zenodo community! ALD saturation profile open data. Ideas? Questions?

Yesterday, I created a new Zenodo community: “ALD saturation profile open data”, https://zenodo.org/communities/ald-saturation-profile-open-data/. In my research group, we intend to use this first for sharing experimental saturation profile data related to a publication we are writing (access through the ChemRxiv, https://doi.org/10.26434/chemrxiv.12366623). … Continue reading

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Virtual guest speaker with Bent group Stanford – other groups interested in an ALD fundamentals talk?

Yesterday, I participated a Prof. Bent group meeting (Stanford), giving again the presentation we gave jointly with Prof. Ruud van Ommen at the recent ALD conference (see previous post), entitled “On the fundamentals of ALD: the importance of getting the … Continue reading

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“On the fundamentals of ALD: the importance of getting the picture right” – by Puurunen and van Ommen

Jointly with Prof. Ruud van Ommen, I (Prof. Riikka Puurunen) gave a presentation at the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020), adapted into a Virtual Meeting, … Continue reading

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Panopto records: November Networking – ALD at Aalto University

At the “November Networking – ALD at Aalto University” event on November 29, 2019, we experimented with recording (some of the) talks with the Panopto lecture capture system available at Aalto University. The records have now been finalized. Each author … Continue reading

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Happy 45th anniversary, ALD in Finland – Aalto ALD OpenLearning opens

Exactly forty-five years ago, on November 29, 1974, the first patent on Atomic Layer Epitaxy (FIN 52359) was filed by Suntola and Antson. Today, the Aalto ALD OpenLearning site is opened for public. You can access it via the general link https://openlearning.aalto.fi/ and the direct link https://openlearning.aalto.fi/course/view.php?id=100. Above … Continue reading

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Advance info on OpenLearning site on Atomic Layer Deposition + request to recommend ALD reviews 

Advance info: On Nov 29, 2019, a new OpenLearning site is planned to open on atomic layer deposition (ALD) at the http://openlearning.aalto.fi platform. The site is meant to benefit the global ALD community and operate mostly in English; occasionally, the … Continue reading

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