Tag Archives: atomic layer deposition

New Zenodo community! ALD saturation profile open data. Ideas? Questions?

Yesterday, I created a new Zenodo community: “ALD saturation profile open data”, https://zenodo.org/communities/ald-saturation-profile-open-data/. In my research group, we intend to use this first for sharing experimental saturation profile data related to a publication we are writing (access through the ChemRxiv, https://doi.org/10.26434/chemrxiv.12366623). … Continue reading

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Virtual guest speaker with Bent group Stanford – other groups interested in an ALD fundamentals talk?

Yesterday, I participated a Prof. Bent group meeting (Stanford), giving again the presentation we gave jointly with Prof. Ruud van Ommen at the recent ALD conference (see previous post), entitled “On the fundamentals of ALD: the importance of getting the … Continue reading

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“On the fundamentals of ALD: the importance of getting the picture right” – by Puurunen and van Ommen

Jointly with Prof. Ruud van Ommen, I (Prof. Riikka Puurunen) gave a presentation at the AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020), adapted into a Virtual Meeting, … Continue reading

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Panopto records: November Networking – ALD at Aalto University

At the “November Networking – ALD at Aalto University” event on November 29, 2019, we experimented with recording (some of the) talks with the Panopto lecture capture system available at Aalto University. The records have now been finalized. Each author … Continue reading

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Save the date! November Networking – ALD at Aalto University, 29.11.2019

November Networking – ALD at Aalto University Event in a nutshell: When? Friday, November 29, 2019, at 12-17  Where? Aalto University, School of Chemical Engineering, Kemistintie 1, Espoo, lecture hall Ke1 and the downstairs lobby  Who? ALD-active/interested persons in and … Continue reading

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Invited tutorial at the ALDfun(amentals…) workshop, TU Delft

This summer, I was visiting TU Delft for a period of five weeks, invited by Prof. Ruud van Ommen. Interesting, buzy weeks – also because of the #CVDALD2019 conference, where we had posters (on ALD conformality and ALD history). Thanks … Continue reading

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Prof. Puurunen invited tutorial at ALD for Industry Berlin 2019

On March 19, 2019, I gave an invited tutorial at the ALD for Industry event by … In an Open Teaching atmosphere, I created a Panopto record of the talk and the talk is shared openly. Panopto record: https://aalto.cloud.panopto.eu/Panopto/Pages/Viewer.aspx?id=e05d5cde-6e6c-4893-807d-aa150110c0e3 Slides in … Continue reading

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Lecture capture: Adsorption-controlled catalyst preparation by ALD

Lecture capture shared in an Open Teaching way: CHEM-E1130 Catalysis course, by Prof. Riikka Puurunen: Adsorption-controlled catalyst preparation by ALD (atomic layer deposition). Slides in SlideShare: https://www.slideshare.net/RiikkaPuurunen/adsorptioncontrolled-catalyst-preparation-by-ald/RiikkaPuurunen/adsorptioncontrolled-catalyst-preparation-by-ald Panopto lecture capture, Part 1: https://aalto.cloud.panopto.eu/Panopto/Pages/Viewer.aspx?id=f1d4d447-01d6-4a99-81f9-a9ff00c8acff Panopto lecture capture, Part 2: https://aalto.cloud.panopto.eu/Panopto/Pages/Viewer.aspx?id=eaebf446-03fb-4296-9d95-a9ff00daa0e9 Course in MyCourses: https://mycourses.aalto.fi/course/view.php?id=20383 Youtube: … Continue reading

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Teaching partner: Teaching trial with lightboard (Langmuir isotherm)

Being on tenure track at Aalto University, I need to follow pedagogical studies – which is great! One of the on-going activities is “teaching partner” with my own pedagogical mentor. I get to do trials with teaching – these are … Continue reading

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STG podcasts as source of information on Atomic Layer Deposition

Aalto CHEM doctoral student Giovanni Marin with colleagues has set up a professional-looking podcast STG Podcasts, where STG refers to “Science, Technology and Gaming”. There are several episodes already where scientists working with Atomic Layer Deposition (ALD) have been interviewed. … Continue reading

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