History of ALD – ALD stories podcast Episode 2 with Riikka Puurunen

On October 16, 2020, ALD stories podcast Episode 2 was published, where I (Riikka Puurunen) had an honor of being interviewed by Lie Luo and Patrick Gonzalez of Beneq.

Episode 2 is about the history of atomic layer deposition (ALD), but also other things dear to my heart. Mentioned are for example: conformality; catalysis; 40 Years of ALD in Finland – Photos, Stories (FinALD40 exhibition); Baltic ALD 2014 conference; story of Suntola’s atomic layer epitaxy; two almost parallel inventions of ALD; Beneq applab opening in St. Petersburg 2013; molecular layering; 1st international conference on atomic layer epitaxy 1990; international ALD conference; November Networking – ALD at Aalto University; Millennium Technology Prize; Virtual Project on the History of ALD; ALD window; misconception of full monolayer growth per cycle for ideal ALD; conformality test concept & saturation profile & lumped sticking coefficient.

Persons mentioned, at least: Outi Krause, Suvi Haukka, Tuomo Suntola, Sven Lindfors, Arto Pakkala, Victor Drozd, Valentin Aleskovskii, Angel Yanguas-Gil, Jonas Sundqvist.

Companies mentioned, at least: Microchemistry, Neste, Beneq, Lohja, Picosun.

The podcast is available in at least via:

Reviews in Applied Physics Reviews mentioned:

Essays mentioned on the history of ALD:

  • ALE essay: R. L. Puurunen, “A short history of atomic layer deposition: Tuomo Suntola’s atomic layer epitaxy,” Chemical Vapor Deposition 20 (2014) 332-344; https://doi.org/10.1002/cvde.201402012
  • ML essay: A. A. Malygin,  V. E. Drozd, A. A. Malkov, V. M. Smirnov, “From V. B. Aleskovskii’s “framework” hypothesis to the method of molecular layering/atomic layer deposition,” Chemical Vapor Deposition 21 (2015) 216-240; https://doi.org/10.1002/cvde.201502013

Also mentioned, just published paper on conformality analysis:

  • J. Yim, O. M. E. Ylivaara, M. Ylilammi, V. Korpelainen, E. Haimi, E. Verkama, M. Utriainen, R. L. Puurunen, “Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels,” Physical Chemistry Chemical Physics, 2020, advance article, https://doi.org/10.1039/D0CP03358H

Forgotten to mention: the Aalto OpenLearning site being built around ALD in international collaboration: https://openlearning.aalto.fi/course/view.php?id=100. Maybe once, the ALD Stories podcast Episode 2 will also be linked to this OpenLearning site.

 

Posted by Riikka Puurunen

About Riikka Puurunen

Associate professor, Catalysis Science and Technology, at Aalto since February 2017
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