Registration open for 2020 November Networking – ALD at Aalto University

Continuing the tradition (?) started in 2019, a networking event will be organized around atomic layer deposition (ALD): 2020 November Networking – ALD at Aalto University. The event will take place on November 25 and 26, 2020.

Due to COVID-19, in 2020, the event will be fully online in Zoom. The program will be in two parts:

  • Part 1: Public webinar is open for anyone to attend and has high-level invited speakers: Dr. Jonas Sundqvist, Dr. Tuomo Suntola and Dr. Angel Yanguas-Gil. Additionally, there will be tutorials by Prof. Riikka Puurunen and Prof. Matti Putkonen. (See the webpage & program for details.)
  • Part 2: Local networking is aimed for local (Finland-based) participants. The core of  Part 2 will be an online poster session where submissions from doctoral students, postdocs and other researchers are welcome. Additionally, there will be brief introductions to research groups, companies and projects, and a presentation by Prof. Timo Sajavaara on the characterization of ALD films. For the poster session we hope to create an online experience that resembles a regular conference’s poster session – let’s see how we manage!

The registration link and all related info, including a preliminary program, are found in the event website: Registration was opened on 21.10.2020 and will close for participation with presentation on 11.11.2020 and for participation without presentation 22.11.2020.


Riikka Puurunen (responsible organizer)

Posted by Riikka Puurunen

About Riikka Puurunen

Associate professor, Catalysis Science and Technology, at Aalto since February 2017
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